RT Journal Article
T1 Bricked Subwavelength Gratings: A Tailorable On-Chip Metamaterial Topology
A1 Manuel Luque-Gonzalez, Jose
A1 Ortega-Monux, Alejandro
A1 Halir, Robert
A1 Schmid, Jens H.
A1 Cheben, Pavel
A1 Molina-Fernandez, Inigo
A1 Gonzalo Wanguemert-Perez, J.
K1 anisotropy
K1 integrated optics
K1 multimode interference
K1 silicon photonics
K1 subwavelength grating metamaterials
AB Integrated metamaterials are redefining the capabilities of silicon photonic chips. In providing lithographic control over dielectric permittivity, dispersion and anisotropy, they are enabling photonic devices with unprecedented performance. However, the implementation of these materials at telecom wavelengths often requires a fabrication resolution of the order of 100 nm and below, pushing current wafer-scale fabrication technology to its limits and hindering the widespread exploitation of on-chip metamaterials. Herein, a subwavelength grating metamaterial with bricked topology is proposed, that provides lithographic control over the metamaterial dispersion and anisotropy using a single etch Manhattan-like geometry with pixel dimensions up to 150 x 150 nm(2), thereby easing the path toward fabrication at wafer-scale. The behavior of these structures as biaxial crystals is analytically shown, validating their use in high performance on-chip beam-splitters. Through engineering of the metamaterial anisotropy tensor, the splitters are shown to exhibit sub-decibel insertion losses and imbalance over a 400 nm design bandwidth, via 3D FDTD simulations. The excellent device performance is demonstrated over a 140 nm bandwidth, limited by the measurement setup.
PB Wiley-v c h verlag gmbh
SN 1863-8880
YR 2021
FD 2021-05-02
LK http://hdl.handle.net/10668/18613
UL http://hdl.handle.net/10668/18613
LA en
DS RISalud
RD Apr 7, 2025