RT Journal Article
T1 Subwavelength-Grating Metamaterial Structures for Silicon Photonic Devices
A1 Halir, Robert
A1 Ortega-Monux, Alejandro
A1 Benedikovic, Daniel
A1 Mashanovich, Goran Z.
A1 Wanguemert-Perez, J. Gonzalo
A1 Schmid, Jens H.
A1 Molina-Fernandez, Inigo
A1 Cheben, Pavel
K1 Fiber-to-chip coupler
K1 filter
K1 metamaterial
K1 mid-infrared
K1 near-infrared
K1 polarization
K1 silicon photonics
K1 sensor
K1 subwavelength grating
K1 waveguide
K1 waveguide coupler
K1 Tolerant polarization splitter
K1 Insulator wave-guides
K1 On-insulator
K1 Interleaved trenches
K1 High-directionality
K1 Coupler
K1 Compact
K1 Fabrication
K1 Rotator
K1 Design
AB Segmenting silicon waveguides at the subwave-length scale produce an equivalent homogenous material. The geometry of the waveguide segments provides precise control over modal confinement, effective index, dispersion and birefringence, thereby opening up new approaches to design devices with unprecedented performance. Indeed, with ever-improving lithographic technologies offering sub-100-nm patterning resolution in the silicon photonics platform, many practical devices based on subwavelength structures have been demonstrated in recent years. Subwavelength engineering has thus become an integral design tool in silicon photonics, and both fundamental understanding and novel applications are advancing rapidly. Here, we provide a comprehensive review of the state of the art in this field. We first cover the basics of subwavelength structures, and discuss substrate leakage, fabrication jitter, reduced backscatter, and engineering of material anisotropy. We then review recent applications including broadband waveguide couplers, high-sensitivity evanescent field sensors, low-loss devices for mid-infrared photonics, polarization management structures, spectral filters, and highly efficient fiber-to-chip couplers. We finally discuss the future prospects for subwavelength silicon structures and their impact on advanced device design.
PB Ieee-inst electrical electronics engineers inc
SN 0018-9219
YR 2018
FD 2018-12-01
LK http://hdl.handle.net/10668/18978
UL http://hdl.handle.net/10668/18978
LA en
DS RISalud
RD Apr 18, 2025